The metal sputtering target requires a vacuum melting furnace, or a vacuum sintering furnace or a hydrogen atmosphere sintering furnace for sheet stamping; then a forging hammer and a rolling mill may be required for pressure forming; then a vacuum annealing furnace is required for heat treatment of the target; then the vacuum annealing furnace is needed to heat the target; then ultrasonic non-destructive testing equipment is needed for testing; then scanning electron microscope, ICP, laser particle size analyzer, Fisher's particle size analyzer, metallographic microscope and its sample preparation equipment are needed for chemical composition analysis, metallographic analysis, powder particle size analysis and even texture analysis; then a variety of turning and milling grinders are needed for machining; finally, the target packaging is also needed.
Non-metallic targets require the use of a sintering furnace. The rest of the equipment is the same as the metal sputtering target.
Some sintering furnaces have different atmospheres and may not be universal. For example, the sintering furnace for sintering tungsten and molybdenum is in a vacuum of 2200 degrees in a hydrogen or hydrogen atmosphere, the furnace for sintering the ITO target is in a 1500 degree in a pure oxygen atmosphere, and the one for sintering AZO ceramic sputter target is a kiln continuous sintering furnace in an atmospheric atmosphere.
In the case of aluminum alloy or copper alloy targets, vacuum melting and vacuum casting are generally used. For example, in the case of titanium alloy, it is generally the smelting and casting of a vacuum electron beam melting furnace. In addition, tungsten-molybdenum rotating targets are also used for hot isostatic pressing or hot extrusion, but are generally the most common for forging and rolling.
Generally, the ceramic powder is granulated and formed before sintering. Taking a sintered AZO target as an example, a spray dryer, a ball mill, a press and a steel mold, a cold isostatic press, and a rubber mold may be required. For another example, an ITO ceramic target may require a plaster mold, a slurry agitator, and the etc.
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Oznake: sputtering target
